Christos Messinis (Computational Imaging group) successfully defended his dissertation ‘Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology’ on November 29th.
In his dissertation Messinis writes about his investigation of the potential use of dark-field digital holographic microscopy for advanced semiconductor overlay metrology. He shows first overlay metrology results using a novel off-axis dark-field digital holographic microscopy concept that acquires multiple holograms in parallel by angular frequency multiplexing. The results indicate there is a potential significant improvement and that digital holographic microscopy is a promising technique for future overlay metrology tools.
Messinis defended his dissertation at the Vrije Universiteit under supervision of promotors Arie den Boef, Stefan Witte and Johannes de Boer.
