Our research
Research
ARCNL’s research spans different aspects of nanolithography technology and is organized into three departments: Source, Metrology, and Materials.
Three departments, one technology
ARCNL’s research is organized into three departments:
the Source department focuses on the physics behind generating extreme ultraviolet (EUV) light;
Metrology on new principles for imaging and precision measurement; and
Materials on the behavior and properties of materials relevant to lithography technology.
See our research groups
Our departments
Academic and industrial partnerships
Within ARCNL’s research program, the three departments share a direct alignment with the Research and the Development & Engineering departments at ASML.
In addition, each of ARCNL’s research group leaders are affiliated with one of the partnering universities: University of Amsterdam, Vrije Universiteit Amsterdam, and University of Groningen. In this way we encourage collaboration between ARCNL researchers and their university colleagues and strengthen our academic partnerships.
Contact us
Get in touch
Do you have questions about our research or want to explore possible collaborations? Feel free to contact us.
