Research groups

Explore our research groups

ARCNL has 11 research groups within three departments conducting fundamental research in the physics and chemistry of nanolithography. Our research is inspired by ongoing challenges in the semiconductor industry.

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Our research groups

Computational Imaging

High-Harmonic Generation and EUV Science

Light-Matter Interaction

Paul Planken

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Materials and Surface Science for EUV Lithography

Roland Bliem

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Materials Theory and Modeling

Emilia Olsson

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Nanoscale Imaging and Metrology

Lyuba Amitonova

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Plasma Theory and Modeling

John Sheil

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Short-Wavelength Light Sources for EUV Metrology

Angana Mondal

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