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At ARCNL, researchers from around the world work together to advance our understanding of the physics and chemistry behind nanolithography technology. Here you can find the researchers, group leaders, engineers, and support staff who combine their expertise and dedication to make ARCNL’s discoveries possible.
Rucha Kelkar
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Sabine Auras
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Safa Biryg
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Sagar Dam
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Sarah Rooijmans
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Sebastiaan Heerooms
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Sjors Balsing
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Someshwar Sanjay Ade
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Sonia
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Sophie Eggert
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Stefan Lehmann
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Stefan Witte
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Stella Dees
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Surabhi Aggarwal
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Tamar Cromwijk
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Tanya van Horen
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Thije Tjebbes
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Thomas Goossens
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Thomas Meijvogel
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Thomas Nieboer
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