people directory
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At ARCNL, researchers from around the world work together to advance our understanding of the physics and chemistry behind nanolithography technology. Here you can find the researchers, group leaders, engineers, and support staff who combine their expertise and dedication to make ARCNL’s discoveries possible.
Iwan Snel
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Jan van der Linden
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Jeremy Tjong-Ayong
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Jeroen Weijers
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Jeske Dioquino
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Jitse Korver
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Jorijn Kuster
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Jusra Hassan – Cairo
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Kallinikos Taouktsoglou
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Lina Bartosyte
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Linda Dekker
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Lucy Karremans
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Mahamadou Traore
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Marco Seynen
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Marco van Zanten
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Marjan Fretz
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Mark Willemse
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Max Postma
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Menno Borsboom
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Miranda van Es
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