Publication overview
393 publications found in Articles
Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry
A.C.C. Beurs, X. Liu, G.S.M. Jansen, S. Konijnenberg, W. Coene, K.S.E. Eikema, S. Witte, Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry, Opt. Express 28, 5257-5266, (2020)
Measuring laser beam quality, wavefronts, and lens aberrations using ptychography
M. Du, L. Loetgering, K.S.E. Eikema, S. Witte, Measuring laser beam quality, wavefronts, and lens aberrations using ptychography, Opt. Express 28, 5022-5034, (2020)
Ageing of Polymer Frictional Interfaces: The Role of Quantity and Quality of Contact
D. Petrova, D.K. Sharma, M. Vacha, D. Bonn, A.M. Brouwer, B. Weber, Ageing of Polymer Frictional Interfaces: The Role of Quantity and Quality of Contact, ACS Appl. Mater. Interfaces 12, 9890-9895, (2020)
Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst, S. Castellanos Ortega, Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography, ACS Appl. Mater. Interfaces 12, 9881-0889, (2020)
Wear particle dynamics drive the difference between repeated and non-repeated reciprocated sliding
F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber, S.E. Franklin, Wear particle dynamics drive the difference between repeated and non-repeated reciprocated sliding, Tribol.Int. 142, 105983: 1-8, (2020)
Spectral characterization of an industrial EUV light source for nanolithography
F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, Spectral characterization of an industrial EUV light source for nanolithography, J. Phys. D: Appl. Phys. 53, 055204: 1-7, (2020)
Sensitivity analysis of Raman endoscopy with and without wavefront shaping
L.V. Amitonova, J.F. Boer, Sensitivity analysis of Raman endoscopy with and without wavefront shaping, Opt. Express 28, 3779-3788, (2020)
Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3
D. Kim, R. Bliem, F. Hess, J.-J. Gallet, B. Yildiz, Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3, J. Am. Chem. Soc. 142, 3548-3563, (2020)
Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound
H. Zhang, A. Antoncecchi, S. Edward, I. Setija, P.C.M. Planken, S. Witte, Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound, Phys. Rev. Appl. 13, 014010: 1-14, (2020)
Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes
D. Petrova, B. Weber, C. Allain, P. Audebert, C.H. Venner, A.M. Brouwer, D. Bonn, Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes, Sci. Adv. 5, eaaw4761: 1-9, (2019)
Tunable superlubricity of 2-dimensional materials
D. Bonn, J.W.M. Frenken, Tunable superlubricity of 2-dimensional materials, PNAS 116, 24386-24387, (2019)
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci, S. Castellanos Ortega, Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters, J. of Micro/Nanolithography. MEMS and MOEMS 18, 043504: 1-11, (2019)
Computational-imaging-based optical coherence tomography in time- and frequency-domain
M. Du, K.S.E. Eikema, S. Witte, Computational-imaging-based optical coherence tomography in time- and frequency-domain, OSA Continuum 2, 3141-3152, (2019)
Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method
L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci, S. Castellanos Ortega, Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method, Eur. J. Inorg. Chem. 2019, 4136-4141, (2019)
An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm
T. Faria Pinto, J. Mathijssen, S. Witte, K.S.E. Eikema, An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm, Opt. Express 27, 29829-29837, (2019)
Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst
Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini, G.S. Parkinson, Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst, Angew. Chem. Int. Ed. 131, 14099-14106, (2019)
Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma, Appl. Phys. Lett. 115, 124101: 1-6, (2019)
Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions
S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra, G. O’Sullivan, Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions, J. Phys. B: At. Mol. Opt. Phys. 52, 171002: 1-49, (2019)
Broadband extreme ultraviolet dispersionmeasurements using a high-harmonic source
G.S.M. Jansen, X. Liu, K.S.E. Eikema, S. Witte, Broadband extreme ultraviolet dispersionmeasurements using a high-harmonic source, Opt. Lett. 44, 3625-3628, (2019)
Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
O.O. Versolato, Physics of laser-driven tin plasma sources of EUV radiation for nanolithography, Plasma Sources Sci. Technol. 28, 083001:1-17, (2019)