Publication overview
34 publications found in Proceedings
Few-cycle OPCPA at 2 µm with up to 100 W average power
J.H. Buss, S. Starosielec, I. Grguras, T. Golz, M.J. Prandolini, M. Schulz, P.M. Kraus, R. Riedel, Few-cycle OPCPA at 2 µm with up to 100 W average power, OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.3, (2020)
Towards High Harmonic Generation in Laser-Produced Plasma
A. Schulte, J. Mathijssen, K.S.E. Eikema, S. Witte, Towards High Harmonic Generation in Laser-Produced Plasma, OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper ETh3A.4, (2020)
Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
C. Messinis, T.T.M. Schaijk, V. Tenner, J.F. Boer, S. Witte, A.J. den Boef, Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology, Imaging and Applied Optics Congress, paper CF4C.6, (2020)
Imaging Applications of Time-Domain Wavefront Shaping
M.C. Velsink, L.V. Amitonova, P.W.H. Pinkse, Imaging Applications of Time-Domain Wavefront Shaping, Frontiers in Optics / Laser Science, paper FW5F.3, (2020)
Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm
J. Mathijssen, T. Faria Pinto, A. Schulte, K.S.E. Eikema, S. Witte, Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm, OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, (2020)
Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes
Z. Mazzotta, R.A. Meijer, D. Kurilovich, R. Schupp, O.O. Versolato, K.S.E. Eikema, S. Witte, Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes, OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EM1A.4, (2020)
Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation
L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W.M.G. Ubachs, O.O. Versolato, Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation, OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2, (2020)
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
N. Thakur, M. Vockenhuber, Y. Ekinci, S. Castellanos Ortega, Zinc-based metal oxoclusters: towards enhanced EUV absorptivity, Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D 10957, 1-11, (2019)
The role of the organic shell in hybrid molecular materials for EUV lithography
L. Wu, M. Vockenhuber, Y. Ekinci, S. Castellanos Ortega, The role of the organic shell in hybrid molecular materials for EUV lithography, Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D 10957B, (2019)
Polarimetric and interferometric measurement of orbital angular momentum imparted by single plasmon nano-antennas
R. Röhrich, C. Hoekmeijer, C.I. Osorio, A.F. Koenderink, Polarimetric and interferometric measurement of orbital angular momentum imparted by single plasmon nano-antennas, Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP), CTh3A.2, (2019)
Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
S. Castellanos Ortega, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci, T. Jung, Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists, Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography 10583, 105830A: 1-12, (2018)
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson, A.M. Brouwer, Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy, Proceedings SPIE, (2017)
Absorption and exposure kinetics of photoresists at EUV
R. Fallica, J. Haitjema, L. Wu, S. Castellanos Ortega, A.M. Brouwer, Y. Ekinci, Absorption and exposure kinetics of photoresists at EUV, Proceedings SPIE 10143, 101430A: 1-11, (2017)
Extreme ultraviolet patterning of tin-oxo cages
J. Haitjema, Y. Zhang, M. Vockenhuber, D. Kazazis, Y. Ekinci, A.M. Brouwer, Extreme ultraviolet patterning of tin-oxo cages, Proceedings SPIE, (2017)