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At ARCNL, researchers from around the world work together to advance our understanding of the physics and chemistry behind nanolithography technology. Here you can find the researchers, group leaders, engineers, and support staff who combine their expertise and dedication to make ARCNL’s discoveries possible.
Angana Mondal
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Arie den Boef
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Bart Weber
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Emilia Olsson
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John Sheil
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Kjeld Eikema
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Lyuba Amitonova
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Oscar Versolato
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Paul Planken
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Peter Kraus
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Roland Bliem
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Ronnie Hoekstra
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Wim Ubachs
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