people directory
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At ARCNL, researchers from around the world work together to advance our understanding of the physics and chemistry behind nanolithography technology. Here you can find the researchers, group leaders, engineers, and support staff who combine their expertise and dedication to make ARCNL’s discoveries possible.
Jon Cottom
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Jorijn Kuster
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Junghoon Kim
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Jusra Hassan – Cairo
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Kallinikos Taouktsoglou
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Kevin-Lee Bieshaar
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Kian Goeloe
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Kjeld Eikema
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Klaasjan van Druten
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Koyo Yoshihara
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Kui An
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Lara Smit
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Laurens van Buuren
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Lennart Tinge
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Lina Bartosyte
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Lina-Henriette Schwering
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Linda Carano
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Linda Dekker
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Lodi Kamman
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Luc Assink
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