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At ARCNL, researchers from around the world work together to advance our understanding of the physics and chemistry behind nanolithography technology. Here you can find the researchers, group leaders, engineers, and support staff who combine their expertise and dedication to make ARCNL’s discoveries possible.
Rucha Kelkar
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Rutger Schoone
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Sabine Auras
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Safa Biryg
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Sagar Dam
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Sagar Kalyan
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Sakina Zemmouri
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Sanny Tang
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Sarah Rooijmans
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Saskia Kemner
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Sebastiaan Heerooms
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Sebastiaan Verbauwen
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Sjors Balsing
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Someshwar Sanjay Ade
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Sonia
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Sophie Eggert
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Stefan Lehmann
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Stefan Witte
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Stella Dees
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Surabhi Aggarwal
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